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CP4000化學拋光機

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Logitech精密材料表面處理: 晶圓拋光晶圓背減薄碲鋅鉻材料磨拋機三五族材料磨拋機精密研磨拋光系統(tǒng) 化學機械研磨拋光智能研磨拋光機化學拋光設(shè)備精密切割設(shè)備薄片制備系統(tǒng) 自動粘片機粘片、測量檢測設(shè)備備品備件和耗材

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Chemicals typically used in prime face polishing of semiconductor wafers or electronic and optoelectronic crystals, such as Bromine Methanol or acid etches, are highly aggressive and require ......

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Chemicals typically used in prime face polishing of semiconductor wafers or electronic and optoelectronic crystals, such as Bromine Methanol or acid etches, are highly aggressive and require the use of specialised corrosive resistant equipment.

The CP4000 has been designed exactly for this application, and utilises a chemical etch polishing process to produce high quality results with minimal subsurface damage.