Helios 5 Laser PFIB System
- 公司名稱 賽默飛世爾科技（中國）有限公司
- 品牌 FEI/賽默飛
- 型號
- 產(chǎn)地
- 廠商性質(zhì) 生產(chǎn)廠家
- 更新時間 2025/1/20 16:33:49
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科學(xué)儀器
Helios 5 Laser PFIB System
FIB SEM laser tool for high throughput millimeter scale cross sectioning and 3D characterization with nanometer resolution
The Thermo Scientific Helios 5 Laser PFIB System combines the best-in-class monochromated Elstar Scanning Electron Microscopy (SEM) Column with a plasma focused ion beam (PFIB) and a femtosecond laser to produce a high-resolution imaging and analysis tool with in-situ ablation capability, offering unprecedented material removal rates for fast millimeter-scale characterization at nanometer resolution.
Key Features
Fast material removal
Millimeter-scale cross sections with up to 15,000x faster material removal than a typical gallium focused ion beam.
Accurate and repeatable cut placement
The same coincident point for all 3 beams (SEM/PFIB/laser) enables accurate and repeatable cut placement and 3D characterization.
High throughput processing of challenging materials
Includes non-conductive or ion-beam-sensitive samples.
Shares all capabilities of the Helios 5 PFIB platform
High-quality gallium-free TEM and APT sample preparation and high-resolution imaging capabilities.
Statistically relevant subsurface and 3D data analysis
Acquire data for much larger volumes within a shorter amount of time.
Fast characterization of deep subsurface features
Extraction of subsurface TEM lamella or chunks for 3D analysis.
Fast and easy characterization of air-sensitive samples
No need to transfer samples between different instruments for imaging and cross-sectioning.
Specifications
| Femtosecond-laser specifications | ||
|---|---|---|
| Laser integration |
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| Laser Output | ||
| First Harmonic |
| 1030 nm (IR) |
| <280 fs | |
| Second Harmonic |
| 515 nm (green) |
| <300 fs | |
| Optics | ||
| Coincident point |
| |
| Objective lens |
| |
| Polarization |
| |
| Repetition rate |
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| Position accuracy |
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| Protective shutter |
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| Software |
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| Safety |
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